| Plasma Model | | RIE/DP | RIE : Reactive Ion Etching
DP : Direct Plasma | | RF Generator | | 10 to 500W | | OscillatingFrequency | | 13.56MHz | | Chamber Size (mm) | | 344W×230D×45H | | In-Line and Stａnd Alone Type (Strip to Strip process) Outline
Two lead frame(strip)vertical or parallel loading function. Pull out two stripfromMagazine--Loading two strip into the chamber--Plasumacleaningprocess--Unloading two strip from chamber--Strip goes tomagazineor next process to direct.
Total system controlled by PLC controller. LCD touch paneldisplayａnd operation. Lead frame (strip) size--Up to 25 to80(W)×100 to250(L)×0.2 to 2.5(t)mm also. We can provide CustomizedIn-Lineplasma. Feature - Special electrode built inforgetting good plasma efficient.
- RIE/DP mode selectable
- RF power up to 500W
- All automatic operation
- LCD touch panel andPLCcontrol
- Any chamber sizeareavailable for customer's Lead frameorstrip.
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